EE 407 Mikroelektronik Üretim


Sabancı Üniversitesi

Mühendislik ve Doğa Bilimleri Fakültesi

Bilgisayar Bilimi ve Mühendisliği

Genel Bilgiler


In depth understanding of the unit processes involved in IC fabrication, including diffusion, oxidation, ion implantation, lithography, dry/wet etching, physical and chemical vapor deposition techniques.
To learn the fundamental theory and operation of equipments used in different microelectronic processes.
Identify the performance metrics for each unit process, learn the governing equations to model each process, and how deviations from an ideal process affect device characteristics.
To learn about mask layout, and understand the reasons for layout rules in VLSI design.
Getting hands-on experience in the cleanroom and practicing the unit processes learned in class.
Learn about process modeling tools, device characterization and inspection techniques.
Develop an understanding of modern CMOS fabrication technology, learn about process integration, and be able to develop and understand fabrication flow diagrams.

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